一、 访问情况： 应日本2019 IWDTF组委会的邀请，浙江大学Choonghyun Lee博士于 2019年11月15日至2019年11月25日赴日本东京参加2019年度未来电 子器件之介质薄膜科学与技术的国际论坛报告会（the 2019 International Workshop on Dielectric Thin Films for future electron device： science and technology(2019 IWDTF)）。 二、访问成果 During the international conference held in Japan, I exchanged the technical opinions with attendees and learned new information about my research interestes. I've had multiple technical discussions with other professors and researchers from Universities, industries, and research institutes in the world. Also, possible research collaboration was discussed with the University of Tokyo and National Institute of Advanced Industrial Science and Technology (AIST) in Japan. I believe a new international collaboration in semiconductor process and device research field would become more important in the near future. 三、工作建议 无 |