您的位置 : | 题目：Modern Thin Film Deposition Technologies 时间：2017年6月27、29、30日 晚上6:00-9:00 地点： 信电楼117—119会议室 报告人：谢亚宏 （Ya-Hong Xie） 教授 |  |
Description:
The course introduces the fundamental physics governing thin film deposition technique, especially physical vapor deposition.
The logic flow of the course will be following the atoms as they leave the source, traverse the space between the source and the substrate, arrive and migrate on the surface of the substrate and finally incorporating into part of the thin film. We will introduce theoretical approach to describe the physical process at each of the above mentioned stages and more importantly the critical factors impacting the kinetics. The focus will be on physical vapor deposition with an introduction to chemical vapor deposition techniques.
Several of the frequently employed techniques for thin film characterization will also be discussed.
Biography
Ya-Hong Xie is a professor of materials sciences and engineering at UCLA and a GuangBiao chair professor at Zhejiang University. Prior to joining UCLA, he spent 13 years as a member of the technical staff in the Physical Sciences and Engineering Research Division, Bell Laboratories.
Prof. Xie has been conducting research in the field of epitaxial growth of semiconductor thin films for over 30 years. His research interests also include the study of optoelectronic processes and electron transports in semiconductor heterostructures. More recently, he became highly interested in bio-sensing using surface plasmonics.
Dr. Xie is a fellow of IEEE and the winner of 2012 Research Award of Alexander von Humboldt Foundation. He has been a visiting scientist of IHP, the Leibniz Association Germany Institut für Innovative Mikroelektronik since 2010.
